| LCST and UCST in One: Double Thermoresponsive Behavior of Block Copolymers of Poly(ethylene glycol) and Poly(acrylamide-co-acrylonitrile) F Käfer, F Liu, U Stahlschmidt, V Jérôme, R Freitag, M Karg, S Agarwal Langmuir 31 (32), 8940-8946, 2015 | 94 | 2015 |
| Let there be light: Polymeric micelles with upper critical solution temperature as light‐triggered heat nanogenerators for combating drug‐resistant cancer Y Deng, F Käfer, T Chen, Q Jin, J Ji, S Agarwal Small 14 (37), 1802420, 2018 | 70 | 2018 |
| Tunable, concentration‐independent, sharp, hysteresis‐free UCST phase transition from poly(N‐acryloyl glycinamide‐acrylonitrile) system F Käfer, A Lerch, S Agarwal Journal of Polymer Science Part A: Polymer Chemistry 55 (2), 274-279, 2017 | 37 | 2017 |
| Tuning the Phase Transition from UCST‐Type to LCST‐Type by Composition Variation of Polymethacrylamide Polymers F Käfer, M Pretscher, S Agarwal Macromolecular Rapid Communications 39 (24), 1800640, 2018 | 22 | 2018 |
| Review of essential use of fluorochemicals in lithographic patterning and semiconductor processing CK Ober, F Käfer, J Deng Journal of Micro/Nanopatterning, Materials, and Metrology 21 (1), 010901-010901, 2022 | 17 | 2022 |
| Recent developments in photoresists for extreme-ultraviolet lithography CK Ober, F Käfer, C Yuan Polymer, 126020, 2023 | 14 | 2023 |
| New Approaches to EUV Photoresists: Studies of Polyacetals and Polypeptoids to Expand the Photopolymer Toolbox J Deng, F Kaefer, S Bailey, Y Otsubo, Z Meng, R Segalman, CK Ober Journal of photopolymer science and technology 34 (1), 71-74, 2021 | 8 | 2021 |
| Polymer‐Grafted Nanoparticles (PGNs) with Adjustable Graft‐Density and Interparticle Hydrogen Bonding Interaction C Yuan, F Käfer, CK Ober Macromolecular Rapid Communications 43 (12), 2100629, 2022 | 6 | 2022 |
| Effect of monomer hydrophilicity on ARGET–ATRP kinetics in aqueous mini‐emulsion polymerization A Cintora, F Käfer, C Yuan, CK Ober Journal of Polymer Science 60 (4), 666-673, 2022 | 5 | 2022 |
| Structural Insights into Polymethacrylamide-Based LCST Polymers in Solution: A Small-Angle Neutron Scattering Study A Lerch, F Käfer, S Prévost, S Agarwal, M Karg Macromolecules 54 (16), 7632-7641, 2021 | 5 | 2021 |
| Controlled Sequence Photoresists from Polypeptoids F Kaefer, Z Meng, R Segalman, CK Ober Journal of Photopolymer Science and Technology 35 (1), 29-33, 2022 | 4 | 2022 |
| Silica‐PMMA hairy nanoparticles prepared via phase transfer‐assisted aqueous miniemulsion atom transfer radical polymerization DY Wu, F Käfer, N Diaco, CK Ober Journal of Polymer Science 58 (17), 2310-2316, 2020 | 4 | 2020 |
| Interpenetrating thermophobic and thermophilic dual responsive networks F Käfer, Y Hu, YJ Wang, ZL Wu, S Agarwal Journal of Polymer Science Part A: Polymer Chemistry 57 (4), 539-544, 2019 | 4 | 2019 |
| Synthesis of N‐Substituted Maleimides and Poly(styrene‐co‐N‐maleimide) Copolymers and Their Potential Application as Photoresists GA Eken, F Käfer, C Yuan, I Andrade, CK Ober Macromolecular Chemistry and Physics 224 (1), 2200256, 2023 | 2 | 2023 |
| Controlled sequence peptoids as photoresist platforms for high-resolution DUV/EUV photoresists XZ Meng, FH Käfer, GM Wallraff, CK Ober, RA Segalman International Conference on Extreme Ultraviolet Lithography 2022 12292, 208-213, 2022 | 2 | 2022 |
| Controlled‐Release LCST‐Type Nonwoven Depots via Squeezing‐Out Thermal Response F Käfer, R Vilensky, G Vasilyev, E Zussman, S Agarwal Macromolecular Materials and Engineering 304 (3), 1800606, 2019 | 2 | 2019 |
| Sequence-defined polypeptoid CARs for electron-beam and EUV lithography F Kaefer, CK Ober, Z Meng, R Segalman, JR de Alaniz Advances in Patterning Materials and Processes XL 12498, 222-226, 2023 | 1 | 2023 |
| Controlling Anti-Penetration Performance by Post-Grafting of Fluorinated Alkyl Chains onto Polystyrene-block-poly(vinyl methyl siloxane) Z Zhang, K Chaudhuri, F Kaefer, AP Malanoski, KA Page, LM Smieska, ... ACS Applied Materials & Interfaces, 2024 | | 2024 |
| Polypeptoids: Exploring the Power of Sequence Control in a Photoresist for Extreme‐Ultraviolet Lithography F Käfer, C Wang, Y Huang, F Bard, R Segalman, CK Ober Advanced Materials Technologies 8 (23), 2301104, 2023 | | 2023 |
| Sequence-defined polypeptoids as DUV and EUV chemically amplified resists CP Adams, X Meng, FH Kaefer, C Yuan, CK Ober, RA Segalman International Conference on Extreme Ultraviolet Lithography 2023, PC127500J, 2023 | | 2023 |
