Metalorganic chemical vapor phase epitaxy of crack-free GaN on Si (111) exceeding 1 µm in thickness A Dadgar, J Bläsing, A Diez, A Alam, M Heuken, A Krost Japanese Journal of Applied Physics 39 (11B), L1183, 2000 | 396 | 2000 |
GaN-based optoelectronics on silicon substrates A Krost, A Dadgar Materials Science and Engineering: B 93 (1-3), 77-84, 2002 | 383 | 2002 |
Thick, crack-free blue light-emitting diodes on Si(111) using low-temperature AlN interlayers and in situ masking A Dadgar, M Poschenrieder, J Bläsing, K Fehse, A Diez, A Krost Applied Physics Letters 80 (20), 3670-3672, 2002 | 233 | 2002 |
Template‐assisted large‐scale ordered arrays of ZnO pillars for optical and piezoelectric applications HJ Fan, W Lee, R Hauschild, M Alexe, G Le Rhun, R Scholz, A Dadgar, ... Small 2 (4), 561-568, 2006 | 223 | 2006 |
GaN‐based devices on Si A Krost, A Dadgar physica status solidi (a) 194 (2), 361-375, 2002 | 207 | 2002 |
MOVPE growth of GaN on Si (1 1 1) substrates A Dadgar, M Poschenrieder, J Bläsing, O Contreras, F Bertram, ... Journal of Crystal Growth 248, 556-562, 2003 | 190 | 2003 |
Arrays of vertically aligned and hexagonally arranged ZnO nanowires: a new template-directed approach HJ Fan, W Lee, R Scholz, A Dadgar, A Krost, K Nielsch, M Zacharias Nanotechnology 16 (6), 913, 2005 | 179 | 2005 |
Recording of cell action potentials with field-effect transistors G Steinhoff, B Baur, G Wrobel, S Ingebrandt, A Offenhäusser, A Dadgar, ... Applied Physics Letters 86 (3), 033901, 2005 | 172 | 2005 |
GaN‐based epitaxy on silicon: stress measurements A Krost, A Dadgar, G Strassburger, R Clos physica status solidi (a) 200 (1), 26-35, 2003 | 169 | 2003 |
High Si and Ge n-type doping of GaN doping-Limits and impact on stress S Fritze, A Dadgar, H Witte, M Bügler, A Rohrbeck, J Bläsing, A Hoffmann, ... Applied Physics Letters 100 (12), 122104, 2012 | 162 | 2012 |
High-sheet-charge–carrier-density field-effect transistors on Si(111) A Dadgar, F Schulze, J Bläsing, A Diez, A Krost, M Neuburger, E Kohn, ... Applied physics letters 85 (22), 5400-5402, 2004 | 158 | 2004 |
The origin of stress reduction by low-temperature AlN interlayers J Bläsing, A Reiher, A Dadgar, A Diez, A Krost Applied physics letters 81 (15), 2722-2724, 2002 | 158 | 2002 |
Atomic arrangement at the AlN/Si (111) interface R Liu, FA Ponce, A Dadgar, A Krost Applied Physics Letters 83 (5), 860-862, 2003 | 151 | 2003 |
Epitaxy of GaN on silicon—impact of symmetry and surface reconstruction A Dadgar, F Schulze, M Wienecke, A Gadanecz, J Bläsing, P Veit, ... New Journal of Physics 9 (10), 389, 2007 | 144 | 2007 |
Growth of blue GaN LED structures on 150-mm Si (1 1 1) A Dadgar, C Hums, A Diez, J Bläsing, A Krost Journal of Crystal Growth 297 (2), 279-282, 2006 | 143 | 2006 |
Well-ordered ZnO nanowire arrays on GaN substrate fabricated via nanosphere lithography HJ Fan, B Fuhrmann, R Scholz, F Syrowatka, A Dadgar, A Krost, ... Journal of Crystal Growth 287 (1), 34-38, 2006 | 141 | 2006 |
Metal-organic vapor phase epitaxy and properties of AlInN in the whole compositional range C Hums, J Bläsing, A Dadgar, A Diez, T Hempel, J Christen, A Krost, ... Applied Physics Letters 90 (2), 022105, 2007 | 137 | 2007 |
Efficient stress relief in GaN heteroepitaxy on Si (1 1 1) using low-temperature AlN interlayers A Reiher, J Bläsing, A Dadgar, A Diez, A Krost Journal of crystal growth 248, 563-567, 2003 | 136 | 2003 |
Bright blue electroluminescence from an InGaN/GaN multiquantum-well diode on Si (111): Impact of an AlGaN/GaN multilayer A Dadgar, J Christen, T Riemann, S Richter, J Bläsing, A Diez, A Krost, ... Applied Physics Letters 78 (15), 2211-2213, 2001 | 132 | 2001 |
Dislocation annihilation by silicon delta-doping in GaN epitaxy on Si O Contreras, FA Ponce, J Christen, A Dadgar, A Krost Applied physics letters 81 (25), 4712-4714, 2002 | 128 | 2002 |