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Ravi Bonam
Ravi Bonam
Research Staff, IBM
Verificeret mail på us.ibm.com
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Towards outperforming conventional sensor arrays with fabricated individual photonic vapour sensors inspired by Morpho butterflies
RA Potyrailo, RK Bonam, JG Hartley, TA Starkey, P Vukusic, M Vasudev, ...
Nature communications 6 (1), 7959, 2015
1982015
Building a better methane generation model: Validating models with methane recovery rates from 35 Canadian landfills
S Thompson, J Sawyer, R Bonam, JE Valdivia
Waste management 29 (7), 2085-2091, 2009
1942009
Discovery of the surface polarity gradient on iridescent Morpho butterfly scales reveals a mechanism of their selective vapor response
RA Potyrailo, TA Starkey, P Vukusic, H Ghiradella, M Vasudev, T Bunning, ...
Proceedings of the National Academy of Sciences 110 (39), 15567-15572, 2013
992013
Direct bonded heterogeneous integration (DBHi) Si bridge
K Sikka, R Bonam, Y Liu, P Andry, D Parekh, A Jain, M Bergendahl, ...
2021 IEEE 71st Electronic Components and Technology Conference (ECTC), 136-147, 2021
352021
Performance characterization of negative resists for sub-10-nm electron beam lithography
R Bonam, P Verhagen, A Munder, J Hartley
Journal of Vacuum Science & Technology B 28 (6), C6C34-C6C40, 2010
242010
Clock-free nanowire crossbar architecture based on null convention logic (ncl)
R Bonam, S Chaudhary, Y Yellambalase, M Choi
2007 7th IEEE Conference on Nanotechnology (IEEE NANO), 85-89, 2007
192007
EUV mask and wafer defectivity: strategy and evaluation for full die defect inspection
R Bonam, HY Tien, A Chou, L Meli, S Halle, I Wu, X Huang, C Lei, C Kuan, ...
Extreme Ultraviolet (EUV) Lithography VII 9776, 382-389, 2016
182016
EUV photomask defects: what prints, what doesn't, and what is required for HVM
J Rankin, ZJ Qi, M Lawliss, E Narita, K Seki, K Badger, R Bonam, S Halle, ...
Photomask Technology 2015 9635, 102-113, 2015
142015
Modeling landfill gas generation to determine targets and strategies to reduce greenhouse gases from landfills
S Thompson, J Sawyer, RK Bonam, S Smith
Journal of Solid Waste Technology and Management 34 (1), 27, 2008
142008
Defect-tolerant gate macro mapping & placement in clock-free nanowire crossbar architecture
R Bonam, YB Kim, M Choi
22nd IEEE International Symposium on Defect and Fault-Tolerance in VLSI …, 2007
142007
Implementation of Static and Semi-Static Versions of a Bit-Wise Pipelined Dual-Rail NCL 2SComplement Multiplier
R Sankar, V Kadiyala, R Bonam, S Kumar, S Mohan, F Kacani, ...
2007 IEEE Region 5 Technical Conference, 228-233, 2007
132007
Deep learning-based detection, classification, and localization of defects in semiconductor processes
DV Patel, R Bonam, AA Oberai
Journal of Micro/nanolithography, MEMS, and MOEMS 19 (2), 024801-024801, 2020
122020
Characterization of e-beam patterned grating structures using Mueller matrix based scatterometry
GR Muthinti, B Peterson, RK Bonam, AC Diebold
Journal of Micro/Nanolithography, MEMS, and MOEMS 12 (1), 013018-013018, 2013
122013
Printability and actinic AIMS review of programmed mask blank defects
E Verduijn, P Mangat, O Wood, J Rankin, Y Chen, F Goodwin, R Capelli, ...
Extreme Ultraviolet (EUV) Lithography VIII 10143, 112-124, 2017
112017
Integrated photoemission sources and scalable photoemission structures
RK Bonam
US Patent 9,263,228, 2016
112016
Operation and performance of the CNSE Vistec VB300 electron beam lithography system
JG Hartley, TR Groves, R Bonam, A Raghunathan, J Ruan, A McClelland, ...
Alternative Lithographic Technologies II 7637, 447-456, 2010
112010
EUV mask black border evolution
C Turley, R Bonam, E Gallagher, J Grohs, M Kagawa, L Kindt, E Narita, ...
Photomask Technology 2014 9235, 251-260, 2014
92014
Engineering neural networks for improved defect detection and classification
D Patel, R Bonam, AA Oberai
Metrology, Inspection, and Process Control for Microlithography XXXIII 10959 …, 2019
82019
Printability of buried extreme ultraviolet lithography photomask defects
K Seki, T Isogawa, M Kagawa, S Akima, Y Kodera, K Badger, ZJ Qi, ...
Journal of Micro/Nanolithography, MEMS, and MOEMS 15 (2), 021004-021004, 2016
82016
ENDEAVOUR to understand EUV buried defect printability
K Seki, T Isogawa, M Kagawa, S Akima, Y Kodera, K Badger, ZJ Qi, ...
Photomask Japan 2015: Photomask and Next-Generation Lithography Mask …, 2015
82015
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Artikler 1–20