Ser Jung Hoon
Ser Jung Hoon
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Citeret af
Polarization stabilization of vertical‐cavity top‐surface‐emitting lasers by inscription of fine metal‐interlaced gratings
JH Ser, YG Ju, JH Shin, YH Lee
Applied physics letters 66 (21), 2769-2771, 1995
Square-lattice photonic-crystal vertical-cavity surface-emitting lasers
KH Lee, JH Baek, IK Hwang, YH Lee, GH Lee, JH Ser, HD Kim, HE Shin
Optics Express 12 (17), 4136-4143, 2004
780 nm oxidised vertical-cavity surface-emitting lasers with Al0. 11Ga0. 89As quantum wells
HE Shin, YG Ju, JH Shin, JH Ser, T Kim, EK Lee, I Kim, YH Lee
Electronics Letters 32 (14), 1287-1288, 1996
High-finesse nonabsorbing optical cavity
HE Shin, YG Ju, HW Song, DS Song, IY Han, JH Ser, HY Ryu, YH Lee, ...
Applied physics letters 72 (18), 2205-2207, 1998
Efficient full-chip SRAF placement using machine learning for best accuracy and improved consistency
S Wang, S Baron, N Kachwala, C Kallingal, D Sun, V Shu, W Fong, Z Li, ...
Optical Microlithography XXXI 10587, 184-192, 2018
Hotspot fixing using ILT
W Sim, S Jung, HJ Lee, S Suh, JH Ser, SW Choi, CJ Kang, T Cecil, ...
Optical Microlithography XXIV 7973, 536-542, 2011
Analysis of metal-interlaced-grating vertical-cavity surface-emitting lasers using the modal method by modal expansion
YG Ju, JH Ser, YH Lee
IEEE journal of quantum electronics 33 (4), 589-595, 1997
Method of manufacturing semiconductor device by using uniform optical proximity correction
SW Kim, CS Suh, SW Choi, J Ser, M Jeong, SB Shim
US Patent 8,392,854, 2013
Direct observation of strong quantum-confined stark effect in vertically-stacked quantum dots at room temperature
JH Ser, YH Lee, JW Kim, JE Oh
Japanese Journal of Applied Physics 39 (6A), L518, 2000
Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effect
M Jeong, SW Choi, JH Ser
US Patent 8,510,684, 2013
Investigation of EUV tapeout flow issues, requirements, and options for volume manufacturing
J Cobb, S Jang, J Ser, I Kim, J Yeap, K Lucas, M Do, YC Kim
Extreme Ultraviolet (EUV) Lithography II 7969, 250-261, 2011
A simplified reaction-diffusion system of chemically amplified resist process modeling for OPC
Y Fan, MG Jeongb, J Ser, SW Lee, C Suh, KI Koo, S Lee, I Su, ...
Optical Microlithography XXIII 7640, 1100-1110, 2010
Reliability in the oxide vertical-cavity surface-emitting lasers exposed to electrostatic discharge
HD Kim, WG Jeong, HE Shin, JH Ser, HK Shin, YG Ju
Optics express 14 (25), 12432-12438, 2006
Fine calibration of physical resist models: the importance of Jones pupil, laser bandwidth, mask error and CD metrology for accurate modeling at advanced lithographic nodes
S Moon, S Yang, A Shamsuarov, E Kim, J Ser, Y Kim, S Choi, C Kang, ...
Optical Microlithography XXIV 7973, 339-346, 2011
Comparison of OPC models with and without 3D-mask effect
JH Ser, TH Park, MG Jeong, EM Lee, SW Lee, CS Suh, SW Choi, CH Park, ...
Optical Microlithography XXIII 7640, 689-694, 2010
Improving model prediction accuracy for ILT with aggressive SRAFs
S Jung, W Sim, M Jeong, J Ser, S Lee, S Choi, X Zhou, L Luan, T Cecil, ...
Photomask Technology 2010 7823, 335-340, 2010
Oxide-apertured photodetector integrated on vertical cavity surface emitting laser
IY Han, JH Ser, HY Ryu, YH Lee
Electronics Letters 35 (20), 1742-1743, 1999
New method to determine process window considering pattern failure
SH Yang, S Moon, J Ser, YC Kim, SW Choi, CJ Kang
Photomask Technology 2010 7823, 159-165, 2010
Enhanced quantum-confined Stark effect of vertically coupled quantum dots at room temperature
JH Ser, YH Lee, JW Kim, JE Oh
Conference on Lasers and Electro-Optics, CWQ7, 2000
Polarization stabilization of vertical-cavity top-surface-emitting lasers
JH Ser, YG Ju, JH Shin, YH Lee
Technical Digest. CLEO/Pacific Rim'95. The Pacific Rim Conference on Lasers …, 1995
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