| Polarization stabilization of vertical‐cavity top‐surface‐emitting lasers by inscription of fine metal‐interlaced gratings JH Ser, YG Ju, JH Shin, YH Lee Applied physics letters 66 (21), 2769-2771, 1995 | 88 | 1995 |
| Square-lattice photonic-crystal vertical-cavity surface-emitting lasers KH Lee, JH Baek, IK Hwang, YH Lee, GH Lee, JH Ser, HD Kim, HE Shin Optics Express 12 (17), 4136-4143, 2004 | 62 | 2004 |
| 780 nm oxidised vertical-cavity surface-emitting lasers with Al0. 11Ga0. 89As quantum wells HE Shin, YG Ju, JH Shin, JH Ser, T Kim, EK Lee, I Kim, YH Lee Electronics Letters 32 (14), 1287-1288, 1996 | 35 | 1996 |
| High-finesse nonabsorbing optical cavity HE Shin, YG Ju, HW Song, DS Song, IY Han, JH Ser, HY Ryu, YH Lee, ... Applied physics letters 72 (18), 2205-2207, 1998 | 23 | 1998 |
| Efficient full-chip SRAF placement using machine learning for best accuracy and improved consistency S Wang, S Baron, N Kachwala, C Kallingal, D Sun, V Shu, W Fong, Z Li, ... Optical Microlithography XXXI 10587, 184-192, 2018 | 18 | 2018 |
| Hotspot fixing using ILT W Sim, S Jung, HJ Lee, S Suh, JH Ser, SW Choi, CJ Kang, T Cecil, ... Optical Microlithography XXIV 7973, 536-542, 2011 | 17 | 2011 |
| Method of manufacturing semiconductor device by using uniform optical proximity correction SW Kim, CS Suh, SW Choi, J Ser, M Jeong, SB Shim US Patent 8,392,854, 2013 | 14 | 2013 |
| Analysis of metal-interlaced-grating vertical-cavity surface-emitting lasers using the modal method by modal expansion YG Ju, JH Ser, YH Lee IEEE journal of quantum electronics 33 (4), 589-595, 1997 | 12 | 1997 |
| Direct observation of strong quantum-confined stark effect in vertically-stacked quantum dots at room temperature JH Ser, YH Lee, JW Kim, JE Oh Japanese Journal of Applied Physics 39 (6A), L518, 2000 | 11 | 2000 |
| Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effect M Jeong, SW Choi, JH Ser US Patent 8,510,684, 2013 | 8 | 2013 |
| Investigation of EUV tapeout flow issues, requirements, and options for volume manufacturing J Cobb, S Jang, J Ser, I Kim, J Yeap, K Lucas, M Do, YC Kim Extreme Ultraviolet (EUV) Lithography II 7969, 250-261, 2011 | 5 | 2011 |
| A simplified reaction-diffusion system of chemically amplified resist process modeling for OPC Y Fan, MG Jeongb, J Ser, SW Lee, C Suh, KI Koo, S Lee, I Su, ... Optical Microlithography XXIII 7640, 1100-1110, 2010 | 5 | 2010 |
| Reliability in the oxide vertical-cavity surface-emitting lasers exposed to electrostatic discharge HD Kim, WG Jeong, HE Shin, JH Ser, HK Shin, YG Ju Optics express 14 (25), 12432-12438, 2006 | 5 | 2006 |
| Fine calibration of physical resist models: the importance of Jones pupil, laser bandwidth, mask error and CD metrology for accurate modeling at advanced lithographic nodes S Moon, S Yang, A Shamsuarov, E Kim, J Ser, Y Kim, S Choi, C Kang, ... Optical Microlithography XXIV 7973, 339-346, 2011 | 3 | 2011 |
| Comparison of OPC models with and without 3D-mask effect JH Ser, TH Park, MG Jeong, EM Lee, SW Lee, CS Suh, SW Choi, CH Park, ... Optical Microlithography XXIII 7640, 689-694, 2010 | 3 | 2010 |
| Improving model prediction accuracy for ILT with aggressive SRAFs S Jung, W Sim, M Jeong, J Ser, S Lee, S Choi, X Zhou, L Luan, T Cecil, ... Photomask Technology 2010 7823, 335-340, 2010 | 1 | 2010 |
| New method to determine process window considering pattern failure SH Yang, S Moon, J Ser, YC Kim, SW Choi, CJ Kang Photomask Technology 2010 7823, 159-165, 2010 | 1 | 2010 |
| Oxide-apertured photodetector integrated on vertical cavity surface emitting laser IY Han, JH Ser, HY Ryu, YH Lee Electronics Letters 35 (20), 1742-1743, 1999 | 1 | 1999 |
| Mask and illumination optimization for low-k1 EUV lithography DS Nam, JH Ser, N Seong, X Li, S Hsu, A Yen Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation …, 2022 | | 2022 |
| Quantum-confined Stark effect of vertically-stacked quantum dots JH Ser 한국과학기술원, 2001 | | 2001 |
