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Stephen Rossnagel
Stephen Rossnagel
UVA Dept Mat. Sci.
Verified email at virginia.edu
Title
Cited by
Cited by
Year
Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions
SM Rossnagel, JJ Cuomo, WD Westwood
(No Title), 1990
1118*1990
Alteration of Cu conductivity in the size effect regime
SM Rossnagel, TS Kuan
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2004
5412004
Metal ion deposition from ionized mangetron sputtering discharge
SM Rossnagel, J Hopwood
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994
4971994
METHOD OF PE-ALD OF SiNxCy AND INTEGRATION OF LINER MATERIALS ON POROUS LOW K SUBSTRATES
AJ Kellock, H Kim, DG Park, SV Nitta, S Purushothaman, S Rossnagel, ...
US Patent App. 12/203,338, 2010
4052010
Magnetron sputter deposition with high levels of metal ionization
SM Rossnagel, J Hopwood
Applied Physics Letters 63 (24), 3285-3287, 1993
3851993
Gas density reduction effects in magnetrons
SM Rossnagel
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (1 …, 1988
3391988
Ionic field effect transistors with sub-10 nm multiple nanopores
SW Nam, MJ Rooks, KB Kim, SM Rossnagel
Nano letters 9 (5), 2044-2048, 2009
3082009
Plasma-enhanced atomic layer deposition of Ta and Ti for interconnect diffusion barriers
SM Rossnagel, A Sherman, F Turner
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2000
2932000
Thin film deposition with physical vapor deposition and related technologies
SM Rossnagel
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21 (5 …, 2003
2902003
Structure for confining the switching current in phase memory (PCM) cells
GW Burr, CH Lam, S Raoux, SM Rossnagel, AG Schrott, JZ Sun, ...
US Patent 7,488,967, 2009
2832009
Directional and ionized physical vapor deposition for microelectronics applications
SM Rossnagel
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998
2161998
Collimated magnetron sputter deposition
SM Rossnagel, D Mikalsen, H Kinoshita, JJ Cuomo
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9 (2 …, 1991
2051991
Phase transformation of thin sputter-deposited tungsten films at room temperature
SM Rossnagel, IC Noyan, C Cabral Jr
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
1832002
Systems and methods for controlling position of charged polymer inside nanopore
S Polonsky, SM Rossnagel, GA Stolovitzky
US Patent 8,003,319, 2011
1792011
Diffusion barrier properties of transition metal thin films grown by plasma-enhanced atomic-layer deposition
H Kim, C Cabral Jr, C Lavoie, SM Rossnagel
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2002
1652002
Robust TaNx diffusion barrier for Cu-interconnect technology with subnanometer thickness by metal-organic plasma-enhanced atomic layer deposition
H Kim, C Detavenier, O Van der Straten, SM Rossnagel, AJ Kellock, ...
Journal of applied physics 98 (1), 2005
1592005
Film modification by low energy ion bombardment during deposition
SM Rossnagel, JJ Cuomo
Thin Solid Films 171 (1), 143-156, 1989
1581989
Current–voltage relations in magnetrons
SM Rossnagel, HR Kaufman
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6 (2 …, 1988
1531988
Novel lithography-independent pore phase change memory
M Breitwisch, T Nirschl, CF Chen, Y Zhu, MH Lee, M Lamorey, GW Burr, ...
2007 IEEE Symposium on VLSI Technology, 100-101, 2007
1502007
Sputter deposition for semiconductor manufacturing
SM Rossnagel
IBM Journal of Research and development 43 (1.2), 163-179, 1999
1501999
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Articles 1–20