| Signal response metrology (SRM): a new approach for lithography metrology S Pandev, F Fang, YK Kim, J Tsai, A Vaid, L Subramany, D Sanko, ... Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015 | 18 | 2015 |
| Implementation of hybrid metrology at HVM fab for 20nm and beyond A Vaid, L Subramany, G Iddawela, C Ford, J Allgair, G Agrawal, J Taylor, ... Metrology, Inspection, and Process Control for Microlithography XXVII 8681 …, 2013 | 14 | 2013 |
| Analysis of wafer heating in 14nm DUV layers L Subramany, WJ Chung, P Samudrala, H Gao, N Aung, JM Gomez, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 11 | 2016 |
| Planar metrology pad adjacent a set of fins of a fin field effect transistor device X Hu, L Subramany, A Vaid, S Gu, A Sehgal US Patent 9,129,905, 2015 | 9 | 2015 |
| Systems and methods for fabricating semiconductor device structures A Vaid, C Hartig, L Subramany US Patent 9,177,873, 2015 | 8 | 2015 |
| Planar metrology pad adjacent a set of fins of a fin field effect transistor device S Gu, X Hu, A Vaid, L Subramany, A Sehgal US Patent 9,121,890, 2015 | 7 | 2015 |
| Integrated production overlay field-by-field control for leading edge technology nodes WJ Chung, J Tristan, K Gutjahr, L Subramany, C Li, Y Sun, M Yelverton, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 7 | 2014 |
| Advanced overlay: sampling and modeling for optimized run-to-run control L Subramany, WJ Chung, P Samudrala, H Gao, N Aung, JM Gomez, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 5 | 2016 |
| Run time scanner data analysis for HVM lithography process monitoring and stability control WJ Chung, YK Kim, J Tristan, JS Kim, L Subramany, C Li, B Riggs, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 4 | 2014 |
| Investigation of trench and contact hole shrink mechanism in the negative tone develop process SS Mehta, C Higgins, V Chauhan, S Pal, HP Koh, JR Fakhoury, S Gao, ... Advances in Resist Materials and Processing Technology XXX 8682, 172-180, 2013 | 4 | 2013 |
| Comparison study of diffraction based overlay and image based overlay measurements on programmed overlay errors H Gao, WJ Chung, N Aung, L Subramany, P Samudrala, JM Gomez Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 3 | 2016 |
| Overlay optimization for 1x node technology and beyond via rule based sparse sampling NL Aung, WJ Chung, L Subramany, S Hussain, P Samudrala, H Gao, ... Metrology, Inspection, and Process Control for Microlithography XXX 9778 …, 2016 | 3 | 2016 |
| CPE run-to-run overlay control for high volume manufacturing L Subramany, WJ Chung, K Gutjhar, M Garcia-Medina, C Sparka, L Yap, ... 2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2015 | 3 | 2015 |
| Process variation challenges and resolution in the negative-tone develop double patterning for 20nm and below technology node SS Mehta, LK Ganta, V Chauhan, Y Wu, S Singh, C Ann, L Subramany, ... Advances in Patterning Materials and Processes XXXII 9425, 89-99, 2015 | 3 | 2015 |
| Novel methodology to optimize wafer alignment to enhance 14nm on product overlay P Samudrala, WJ Chung, L Subramany, H Gao, N Aung, SC Oh, S Lee, ... Optical Microlithography XXX 10147, 530-535, 2017 | 2 | 2017 |
| HVM capabilities of CPE run-to-run overlay control L Subramany, WJ Chung, K Gutjahr, M Garcia-Medina, C Sparka, L Yap, ... Metrology, Inspection, and Process Control for Microlithography XXIX 9424 …, 2015 | 2 | 2015 |
| Lithography focus/exposure control and corrections to improve CDU at post etch step YK Kim, M Yelverton, J Tristan, J Lee, K Gutjahr, CH Hsu, H Wei, L Wang, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 2 | 2014 |
| Evaluation of lens heating effect in high transmission NTD processes at the 20nm technology node B Jeon, S Lee, L Subramany, C Li, S Pal, S Meyers, S Mehta, Y Wei, ... Metrology, Inspection, and Process Control for Microlithography XXVIII 9050 …, 2014 | 2 | 2014 |
| Journey to a Big Data Analysis Platform: Are we there yet? R Goss, L Subramany 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2021 | 1 | 2021 |
| Alignment solutions on FBEOL layers using ASML scanners: AEPM: Advanced equipment processes and materials P Samudrala, G Hart, YJ Chen, L Subramany, H Gao, N Aung, WJ Chung, ... 2018 29th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2018 | 1 | 2018 |
