| A 2.6 nW, 0.45 V temperature-compensated subthreshold CMOS voltage reference L Magnelli, F Crupi, P Corsonello, C Pace, G Iannaccone IEEE Journal of Solid-State Circuits 46 (2), 465-474, 2010 | 272 | 2010 |
| On the properties of the gate and substrate current after soft breakdown in ultrathin oxide layers F Crupi, R Degraeve, G Groeseneken, T Nigam, HE Maes IEEE Transactions on Electron Devices 45 (11), 2329-2334, 1998 | 117 | 1998 |
| Noise in Drain and Gate Current of MOSFETs With High- Gate Stacks P Magnone, F Crupi, G Giusi, C Pace, E Simoen, C Claeys, L Pantisano, ... IEEE Transactions on Device and Materials Reliability 9 (2), 180-189, 2009 | 109 | 2009 |
| Impact strain engineering on gate stack quality and reliability C Claeys, E Simoen, S Put, G Giusi, F Crupi Solid-State Electronics 52 (8), 1115-1126, 2008 | 100 | 2008 |
| Degradation and hard breakdown transient of thin gate oxides in capacitors: Dependence on oxide thickness S Lombardo, A La Magna, C Spinella, C Gerardi, F Crupi Journal of applied physics 86 (11), 6382-6391, 1999 | 97 | 1999 |
| Correlation between Stress-Induced Leakage Current (SILC) and the HfO/sub 2/bulk trap density in a SiO/sub 2//HfO/sub 2/stack F Crupi, R Degraeve, A Kerber, DH Kwak, G Groeseneken 2004 IEEE International Reliability Physics Symposium. Proceedings, 181-187, 2004 | 86 | 2004 |
| Design of a 75‐nW, 0.5‐V subthreshold complementary metal–oxide–semiconductor operational amplifier L Magnelli, FA Amoroso, F Crupi, G Cappuccino, G Iannaccone International Journal of Circuit Theory and Applications 42 (9), 967-977, 2014 | 78 | 2014 |
| Comparative study of drain and gate low-frequency noise in nMOSFETs with hafnium-based gate dielectrics G Giusi, F Crupi, C Pace, C Ciofi, G Groeseneken IEEE transactions on electron devices 53 (4), 823-828, 2006 | 63 | 2006 |
| Structural and electrical analysis of the atomic layer deposition of capacitors with and without an interface control layer A O’Mahony, S Monaghan, G Provenzano, IM Povey, MG Nolan, ... Applied Physics Letters 97 (5), 052904, 2010 | 62 | 2010 |
| Electrical and thermal transient during dielectric breakdown of thin oxides in metal--silicon capacitors S Lombardo, F Crupi, A La Magna, C Spinella, A Terrasi, A La Mantia, ... Journal of applied physics 84 (1), 472-479, 1998 | 62 | 1998 |
| Impact of TFET unidirectionality and ambipolarity on the performance of 6T SRAM cells S Strangio, P Palestri, D Esseni, L Selmi, F Crupi, S Richter, QT Zhao, ... IEEE Journal of the Electron Devices Society 3 (3), 223-232, 2015 | 61 | 2015 |
| Impact of the interfacial layer on the low-frequency noise (1/f) behavior of MOSFETs with advanced gate stacks F Crupi, P Srinivasan, P Magnone, E Simoen, C Pace, D Misra, C Claeys IEEE Electron Device Letters 27 (8), 688-691, 2006 | 58 | 2006 |
| Impact of hot carriers on nMOSFET variability in 45-and 65-nm CMOS technologies P Magnone, F Crupi, N Wils, R Jain, H Tuinhout, P Andricciola, G Giusi, ... IEEE Transactions on Electron Devices 58 (8), 2347-2353, 2011 | 56 | 2011 |
| Mixed tunnel-FET/MOSFET level shifters: A new proposal to extend the tunnel-FET application domain M Lanuzza, S Strangio, F Crupi, P Palestri, D Esseni IEEE Transactions on Electron Devices 62 (12), 3973-3979, 2015 | 53 | 2015 |
| An ultralow-voltage energy-efficient level shifter M Lanuzza, F Crupi, S Rao, R De Rose, S Strangio, G Iannaccone IEEE Transactions on Circuits and Systems II: Express Briefs 64 (1), 61-65, 2016 | 52 | 2016 |
| On the Temperature and Field Dependence of Trap-Assisted Tunneling Current in GeJunctions E Simoen, F De Stefano, G Eneman, B De Jaeger, C Claeys, F Crupi IEEE electron device letters 30 (5), 562-564, 2009 | 52 | 2009 |
| Reliability comparison of triple-gate versus planar SOI FETs F Crupi, B Kaczer, R Degraeve, V Subramanian, P Srinivasan, E Simoen, ... IEEE Transactions on electron devices 53 (9), 2351-2357, 2006 | 52 | 2006 |
| A Sub-Voltage Reference Operating at 150 mV D Albano, F Crupi, F Cucchi, G Iannaccone IEEE Transactions on Very Large Scale Integration (VLSI) Systems 23 (8 …, 2014 | 51 | 2014 |
| Positive bias temperature instability in nMOSFETs with ultra-thin Hf-silicate gate dielectrics F Crupi, C Pace, G Cocorullo, G Groeseneken, M Aoulaiche, M Houssa Microelectronic engineering 80, 130-133, 2005 | 47 | 2005 |
| Observation of hot-carrier-induced nFET gate-oxide breakdown in dynamically stressed CMOS circuits B Kaczer, F Crupi, R Degraeve, P Roussel, C Ciofi, G Groeseneken Digest. International Electron Devices Meeting,, 171-174, 2002 | 47 | 2002 |
Calogero PaceUniversity of CalabriaVerified email at unical.it
