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Co-authors
- S. O. HruszkewyczMaterials Science Department, Argonne National LaboratoryVerified email at anl.gov
- Marc AllainInstitut Fresnel (Aix-Marseille Université)Verified email at fresnel.fr
- Youssef NashedSLAC National Accelerator LaboratoryVerified email at stanford.edu
- Wonsuk ChaArgonne National LaboratoryVerified email at aps.anl.gov
- Saugat KandelSoftware Engineer II, Chan Zuckerberg Imaging InstituteVerified email at u.northwestern.edu
- Robert M. SuterCarnegie Mellon UniversityVerified email at cmu.edu
- Andrew UlvestadTesla, University of Chicago, University of California: San Diego, Argonne National LabVerified email at uchicago.edu
- Chris JacobsenArgonne National Laboratory; Northwestern UniversityVerified email at northwestern.edu
- Xiaojing HuangPhysicist, Brookhaven National LaboratoryVerified email at bnl.gov
- Ross HarderArgonne National LaboratoryVerified email at aps.anl.gov
- virginie chamardCNRS institut FresnelVerified email at fresnel.fr
- David B. MenascheResearch ScientistVerified email at hamiltoniangroup.com
- Anastasios PaterasCenter for Free-Electron Laser Science, Deutsches Elektronen-Synchrotron (DESY)Verified email at desy.de
- Peter KeneseiAdvanced Photon Source, Argonne National Laboratory, Illinois, USAVerified email at anl.gov
- Jonathan AlmerArgonne National LaboratoryVerified email at anl.gov
- Jun-Sang ParkArgonne National LaboratoryVerified email at anl.gov
- F. Joseph HeremansArgonne National Lab, University of ChicagoVerified email at anl.gov
- Hanfei YanBrookhaven National LaboratoryVerified email at bnl.gov
- Yong ChuBrookhaven National LaboratoryVerified email at bnl.gov
- Jeffrey A HawkMaterials Engineer, NETLVerified email at netl.doe.gov